随着集成电路工艺的不断发展，工艺模拟软件功能也在不断的改善，但不足之处也不断暴露出来，工艺模拟过程中没有考虑仪器本身影响。所以在工艺模拟中有必要建立一个模型，本文以离子注入工艺为例,研究沟道效应对离子注入工艺的影响,并在计算机上采用SUPREM-III完成离子注入工艺初始条件的编辑以及离子注入工艺模拟，并对模拟结果曲线进行比较。关键词 离子注入; 沟道效应; 工艺模拟Abstract With the rapid development in the process of intenrated circuits, thefunction of the process simulation software has been improved constantly, but itsshortcoming appear sincreasingly. The influence of equipment on the process has notbeen counted in. In order to promote the improvement of this situation, it isnecessary to establish an equipment model in process simulation. Taking the processof ion implantation as example, some elementary research on ion implantationequipment model considering the influence of the channeling effects on the processis accomplished. The edit of process initial condition and ion implantation processsimulation are done on the computer. The simulation curves are also compared.Key words: ion implantation ; channeling effects ; process simulation
推荐内容
开源项目推荐 更多
热门活动
热门器件
用户搜过
随便看看
热门下载
热门文章
热门标签
京公网安备 11010802033920号
Copyright © 2005-2024 EEWORLD.com.cn, Inc. All rights reserved
评论