有机无机复合ZrO2-SiO2平面光波导采用溶胶凝胶法合成ZrO2-SiO2 有机无机复合光波导材料,通过改变其中ZrO2 的含量来调节材料的折射率,使材料分别适用于平面光波导的导光层( ng≈1. 497) 和衬底层、包层( nb = nc≈1. 479) 。采用旋转涂膜工艺和相应的热处理,在单晶硅基片上制备衬底层、导光层和包层等薄膜,其中导光层介质因具有感光性而可通过紫外光刻来制备光路图案。所得有机无机复合ZrO2-SiO2 板型平面光波导(衬底层+ 导光层) ,用棱镜耦合截断法测试其光损耗在632. 8 nm 波长处约为0. 8 dB/ cm。对板型平面波导的导光层薄膜进行紫外光刻和异丙醇淋洗,制备出脊状光波导通道,在覆盖包层后,即获得埋层沟道式平面光波导。采用端耦合截断法测试了埋层沟道式平面光波导的光损耗(小于0. 1dB/ cm) ,并观察了其近场图像以及导光材料在近红外窗口的吸收光谱。ZrO2-SiO2 organic2inorganic hybrid optical waveguide mate rials we re synthesised by the sol2gel p rocess .Ref ractive index of the hybrid films was adjusted with diffe rent amounts of ZrO2 for the use as guiding laye rs( ref ractive index ng≈1. 497) , buffer laters and clading laye rs ( nb = nc≈1. 479) . The hybrid films were depositedon single2crys tal silicon wafe rs ( <≈10 cm) by sol2gel spin2coating. The guiding layers were UV2photosensitive and so UV2pat te rnable . Optical p ropagation loss in the slab waveguides was measured to be about 0. 8 dB/ cm at 632. 8 nm ,by the cut2back method , using p rism2coupling. The buried channel waveguides we re also p repared by pat ternning the guiding layers of the slab waveguides with UV2curing and rinsing with isop ropanol . Propagation loss in the buried channel waveguides was also measured by the cut2back method , using but t2coupling. The loss was lowe r than the measurement e r ror , or less then 0. 1 dB/ cm at 632. 8 nm. The near2field pat terns were obse rved , and absorption spect rum of the hybrid material for the guiding layers was measured.
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